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+++ b/chap01.tex @@ -16,7 +16,7 @@ The setup of an electron beam evaporator is shown in Figure \ref{fig:e-beam_evap %The crucible is also heated during the evaporation process, in order to prevent it from being damaged, a material with a high melting point is chosen. Tungsten with a melting point of 3695 K ~\cite{Tungsten_melt} is usually chosen. %Additionally, the crucible usually has to be water cooled to avoid outgassing during the evaporation process. -In order to heat the source material it is hit with a high voltage electron beam ($\mathcal{O}$($1$ kV)), emitted by either an electron gun or a filament. This beam usually is focused using magnetic fields to hit the source material. Energy transfer heats the hit atoms and eventually leads to the evaporation according to its vapor pressure.\\ +In order to heat the source material it is hit with a high voltage electron beam ($\mathcal{O}$($1$~kV)), emitted by either an electron gun or a filament. This beam usually is focused using magnetic fields to hit the source material. Energy transfer heats the hit atoms and eventually leads to the evaporation according to its vapor pressure.\\ %The penetration depth of electron with ($<5$ kV) is less than 0.4 $\mu$m (estimated using CASINO Monte Carlo software)~\cite{CASINO} so the heating occurs only very near to the source material's surface. 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The capacitance relay is used to measure $C_i$ in order. }}{42}{figure.caption.52}\protected@file@percent } +\newlabel{fig:diagram_MA_circ_walker}{{3.9}{42}{Diagram showing how communication with the Walker and the Lock-in amplifier is done and how they interact with elements in vacuum. Red lines are input, black lines are output lines. The capacitance relay is used to measure $C_i$ in order}{figure.caption.52}{}} \@setckpt{chap03}{ \setcounter{page}{43} \setcounter{equation}{1} @@ -103,7 +101,7 @@ \setcounter{subfigure}{0} \setcounter{subtable}{0} \setcounter{lstnumber}{1} -\setcounter{@todonotes@numberoftodonotes}{5} +\setcounter{@todonotes@numberoftodonotes}{3} \setcounter{float@type}{8} \setcounter{AM@survey}{0} \setcounter{thm}{0} diff --git a/chap03.tex b/chap03.tex index d695bba791084b7f7c7f39b9bf1fbbb43c9c18c5..116e1d9aa7843f78366ab7eabe6107227ff80ef3 100644 --- a/chap03.tex +++ b/chap03.tex @@ -9,7 +9,7 @@ The amplitude is the peak voltage of the pulse, given in V. The default voltage The sweep period is the time a single pulse lasts, given in ms, with a minimum of 1 ms. The mask aligner setup uses a frequency of 1 kHz by default, which results in a sweep time period of 1 ms. \paragraph{time between sweeps} The "time between sweeps" is the off-time between each pulse where no voltage is applied. It is given in ms and in the mask aligner setup it is kept at 0 ms. -\todo{Maybe image explanation} +%\todo{Maybe image explanation} \subsection{Pulse shape} \begin{figure}[H] @@ -143,7 +143,7 @@ The Arduino digital output pins $22$, $24$, $26$ and $28$ control, which channel Afterward there are $4$ relays, one for each channel that can be shut to prevent any current from being on the output leads, this is mainly a safety measure. The $4$ relays are also controlled by the Arduino from the digital outputs $53$, $51$, $49$ and $47$ for the channels Z1, Z2, Z3 and X respectively. The relays are switched off after a waiting period of $2$ seconds after no signal is supplied to the given channel. \subsection{Programming} -The software used by the Arduino to generate the signal was written in the course of this thesis. It is written in the Arduino's programming language. The software is interfaced with using a serial interface. \todo{What to write} +The software used by the Arduino to generate the signal was written in the course of this thesis. It is written in the Arduino's programming language. The software is controlled via commands send over a serial interface. \todo{What to write} \subsubsection{Parameters} The following parameters can be controlled via the new software: @@ -205,5 +205,3 @@ The communication diagram with the Walker looks slightly different from the one \end{figure} Due to hardware issues with the Walker, no final test with the Mask Aligner attached as a load could not be performed. The actual driving performance could not be tested. Hardware failure caused the positive polarity to no longer reach full $120$ V peak and with a load attached. 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The lower right solder anchor is detached in the image and the lower left solder anchor is bridged with a technique discussed in Section \ref {ch:solder_anchors}}{figure.caption.55}{}} +\newlabel{fig:Repair_Diagram_diagram}{{4.1a}{43}{\relax }{figure.caption.53}{}} +\newlabel{sub@fig:Repair_Diagram_diagram}{{a}{43}{\relax }{figure.caption.53}{}} +\newlabel{fig:Repair_Diagram_image}{{4.1b}{43}{\relax }{figure.caption.53}{}} +\newlabel{sub@fig:Repair_Diagram_image}{{b}{43}{\relax }{figure.caption.53}{}} +\@writefile{lof}{\contentsline {figure}{\numberline {4.1}{\ignorespaces (\subref {fig:Repair_Diagram_diagram}) diagram of front view of a single piezo motor with associated nomenclature. Front plate is turned around and moved to the side. (\subref {fig:Repair_Diagram_image}) shows a roughly corresponding image as a photo of the Mask Aligner. 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(\subref {fig:solder_anchors_examples_glue_bottom}) a solder anchor attached to the bottom of a previously used solder ceramic. 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(\subref {fig:Front_plate_repair_plate}) final front plate assembled}{figure.caption.60}{}} \@writefile{toc}{\contentsline {subsection}{\numberline {4.5.2}Small capacitance stack}{51}{subsection.4.5.2}\protected@file@percent } -\@writefile{lof}{\contentsline {figure}{\numberline {4.9}{\ignorespaces The measured capacitance values for the piezo stacks of the motor Z3. }}{52}{figure.caption.64}\protected@file@percent } -\newlabel{fig:Z3_weaker_stack}{{4.9}{52}{The measured capacitance values for the piezo stacks of the motor Z3}{figure.caption.64}{}} +\@writefile{lof}{\contentsline {figure}{\numberline {4.9}{\ignorespaces The measured capacitance values for the piezo stacks of the motor Z3. }}{52}{figure.caption.61}\protected@file@percent } +\newlabel{fig:Z3_weaker_stack}{{4.9}{52}{The measured capacitance values for the piezo stacks of the motor Z3}{figure.caption.61}{}} \@writefile{toc}{\contentsline {section}{\numberline {4.6}Feed through cabling optimizations}{52}{section.4.6}\protected@file@percent } -\newlabel{fig:Feedthrough_Repairs_left}{{4.10a}{53}{\relax }{figure.caption.65}{}} -\newlabel{sub@fig:Feedthrough_Repairs_left}{{a}{53}{\relax }{figure.caption.65}{}} -\newlabel{fig:Feedthrough_Repairs_right}{{4.10b}{53}{\relax }{figure.caption.65}{}} -\newlabel{sub@fig:Feedthrough_Repairs_right}{{b}{53}{\relax }{figure.caption.65}{}} -\@writefile{lof}{\contentsline {figure}{\numberline {4.10}{\ignorespaces Left (\subref {fig:Feedthrough_Repairs_left}) and right (\subref {fig:Feedthrough_Repairs_right}) side of Mask Aligner flange. \textcolor {tab_red}{Red} circles mark the changes made to the grounding.}}{53}{figure.caption.65}\protected@file@percent } -\newlabel{fig:Feedthrough_Repairs}{{4.10}{53}{Left (\subref {fig:Feedthrough_Repairs_left}) and right (\subref {fig:Feedthrough_Repairs_right}) side of Mask Aligner flange. \textcolor {tab_red}{Red} circles mark the changes made to the grounding}{figure.caption.65}{}} -\@writefile{tdo}{\contentsline {todo}{Here}{53}{section*.66}\protected@file@percent } -\@writefile{lot}{\contentsline {table}{\numberline {4.1}{\ignorespaces The cross capacitance values of mask 1 before and after the optimizations of the feedthrough and capacitance sensor cables.}}{53}{table.caption.67}\protected@file@percent } -\newlabel{tab:cross_cap_after_repair}{{4.1}{53}{The cross capacitance values of mask 1 before and after the optimizations of the feedthrough and capacitance sensor cables}{table.caption.67}{}} +\newlabel{fig:Feedthrough_Repairs_left}{{4.10a}{53}{\relax }{figure.caption.62}{}} +\newlabel{sub@fig:Feedthrough_Repairs_left}{{a}{53}{\relax }{figure.caption.62}{}} +\newlabel{fig:Feedthrough_Repairs_right}{{4.10b}{53}{\relax }{figure.caption.62}{}} +\newlabel{sub@fig:Feedthrough_Repairs_right}{{b}{53}{\relax }{figure.caption.62}{}} +\@writefile{lof}{\contentsline {figure}{\numberline {4.10}{\ignorespaces Left (\subref {fig:Feedthrough_Repairs_left}) and right (\subref {fig:Feedthrough_Repairs_right}) side of Mask Aligner flange. \textcolor {tab_red}{Red} circles mark the changes made to the grounding.}}{53}{figure.caption.62}\protected@file@percent } +\newlabel{fig:Feedthrough_Repairs}{{4.10}{53}{Left (\subref {fig:Feedthrough_Repairs_left}) and right (\subref {fig:Feedthrough_Repairs_right}) side of Mask Aligner flange. \textcolor {tab_red}{Red} circles mark the changes made to the grounding}{figure.caption.62}{}} +\@writefile{lot}{\contentsline {table}{\numberline {4.1}{\ignorespaces The cross capacitance values of mask 1 before and after the optimizations of the feedthrough and capacitance sensor cables.}}{53}{table.caption.63}\protected@file@percent } +\newlabel{tab:cross_cap_after_repair}{{4.1}{53}{The cross capacitance values of mask 1 before and after the optimizations of the feedthrough and capacitance sensor cables}{table.caption.63}{}} \@writefile{toc}{\contentsline {section}{\numberline {4.7}Final test}{53}{section.4.7}\protected@file@percent } -\@writefile{lof}{\contentsline {figure}{\numberline {4.11}{\ignorespaces The final calibration that was performed, after all the optimizations were done. 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Driving of the motors was done in 2000, 4000, 6000, 8000 and 10000 steps under ambient conditions}{figure.caption.64}{}} \@setckpt{chap04}{ \setcounter{page}{55} \setcounter{equation}{0} @@ -110,7 +109,7 @@ \setcounter{subfigure}{0} \setcounter{subtable}{0} \setcounter{lstnumber}{1} -\setcounter{@todonotes@numberoftodonotes}{7} +\setcounter{@todonotes@numberoftodonotes}{3} \setcounter{float@type}{8} \setcounter{AM@survey}{0} \setcounter{thm}{0} diff --git a/chap04.tex b/chap04.tex index 70036c40c68a9e561adb0b349f75c57e571f2198..f90acde2a65185b1b111c1ce343cd8f85de31dcc 100644 --- a/chap04.tex +++ b/chap04.tex @@ -50,7 +50,7 @@ The uses flux has to be cleaned off thoroughly to avoid outgassing as well as sh The soldering anchor points that were previously used on the Mask Aligner are small ($2$ mm x $2$ mm x $6$ mm) \ce{Al2O3} ceramic pieces onto which a small piece of copper, pre-coated with solder, was glued using non-conductive EPO-TEK H70E. All cables coming from the piezo motors can be soldered to this soldering anchor. This allows usage of shorter cables and for the cables to be more cleanly routed. The Ceramic piece was glued to the surface of the Mask Aligner using the same glue.\\ EPO-TEK H70E is recommended to cure at $150$°C for at least 1 hour. For repairs it would be difficult and dangerous to heat the entire Mask Aligner to $150$°C, since the piezo stacks depolarize at temperatures near $150$°C. It is also difficult to heat the glue locally to $150$°C. Due to this it was determined that a different glue should be used. \\ -Torr Seal was determined to have all the necessary qualities and was used as a replacement universally. Torr Seal is a two component epoxy, that can cure at room temperature. It fulfills UHV outgassing requirements\todo{Cite Torrseal data}. It however has the disadvantage of reaching its flash point at $175$°C. For this reason soldering on anything affixed with Torr Seal should be done with care as prolonged exposure to the heat of a soldering iron will lead to deterioration. Also of note is that Torr Seal cannot operate at temperatures below $-45$°C, so usage in a very low temperature environment is no longer possible. \\ +Torr Seal was determined to have all the necessary qualities and was used as a replacement universally. Torr Seal is a two component epoxy, that can cure at room temperature. It fulfills UHV outgassing requirements~\cite{torr_seal}. It however has the disadvantage of reaching its flash point at $175$°C. For this reason soldering on anything affixed with Torr Seal should be done with care as prolonged exposure to the heat of a soldering iron will lead to deterioration. Also of note is that Torr Seal cannot operate at temperatures below $-45$°C, so usage in a very low temperature environment is no longer possible. \\ \begin{figure}[H] \centering @@ -158,7 +158,7 @@ The piezo stacks in the Mask Aligner were also glued in 2015 with the non-conduc Torr Seal was used again. Tests and the data sheet showed that Torr Seal has similar elastic properties to H70E. The right size for a glue dot was determined via testing of spread and comparison with previous glue dot size. These properties needed to be determined so that the piezo could be attached in proper alignment with the surrounding piezos.\\ To perform the actual gluing of the piezo stack, all traces of remaining glue were scratched off the surface of the affected piezo stack (Fig. \ref{fig:Z3_reglue_process_scratched}). Afterward a small dot of Torr Seal was put on the underside of the piezo stack, and it was carefully put in place (Fig. \ref{fig:Z3_reglue_process_dot}). The Mask Aligner was rotated with a clamp so that gravity kept the piezo stack in the place. In order to provide pressure on the piezo stack, the prism was reinserted into the motor and was weighed down. (Fig. \ref{fig:Z3_reglue_process_down}). The entire process can be seen in Figure \ref{fig:Z3_reglue_process}.\\ -The repair of the piezo on motor Z1 happened without problems, but on motor Z3 the piezo turned by about $\approx 4.5^\circ \pm 0.5^\circ$ during the curing process. Since $\cos(5^\circ) \approx 0.996$ this should affect the performance by less than $0.5$ \%. +The repair of the piezo on motor Z1 happened without problems, but on motor Z3 the piezo turned by about $\approx 4.5^\circ \pm 0.5^\circ$ during the curing process. From geometrical consideration ($\cos(4.5^\circ) \approx 0.996$) this should affect the performance by less than $0.5$ \%. \begin{figure}[H] \centering @@ -256,8 +256,6 @@ A last step of optimization that was performed was on the feedthrought cables. T In order to reduce capacitance noise, the cables were shortened and were grounded on the feedthroughs. To connect to the body of the feedthroughs, a female gold pin was soldered to the inside of the feedthrough. The male end was soldered to the coaxial cable shielding with a short copper cable. Only a small section of cable was left unshielded\\ -\todo{Here} - \begin{table}[H] \centering \begin{tabular}{|l|l|l|l|} diff --git a/chap05.aux b/chap05.aux index 67933c7e84ae2a8f0049707e029972749be79ba0..7bf7db44bebf5fbd94e87c3c78b935dd1934e3cc 100644 --- a/chap05.aux +++ b/chap05.aux @@ -4,91 +4,91 @@ \@writefile{lof}{\addvspace {10\p@ }} \@writefile{lot}{\addvspace {10\p@ }} \@writefile{toc}{\contentsline {section}{\numberline {5.1}Evaporation configuration}{55}{section.5.1}\protected@file@percent } -\@writefile{lof}{\contentsline {figure}{\numberline {5.1}{\ignorespaces The approach curve measured for field 1 until full contact.}}{55}{figure.caption.69}\protected@file@percent } -\newlabel{fig:evaporation_approach_curve}{{5.1}{55}{The approach curve measured for field 1 until full contact}{figure.caption.69}{}} -\@writefile{lot}{\contentsline {table}{\numberline {5.1}{\ignorespaces Table with all the evaporation parameters. 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(\subref {fig:evaporation_measured_penumbra_circle_r}) diameter of the circle}{figure.caption.75}{}} +\newlabel{fig:penumbra_tilt_sigmas}{{5.4a}{59}{\relax }{figure.caption.69}{}} +\newlabel{sub@fig:penumbra_tilt_sigmas}{{a}{59}{\relax }{figure.caption.69}{}} +\newlabel{fig:Evaporation_diagramm_field}{{5.4b}{59}{\relax }{figure.caption.69}{}} +\newlabel{sub@fig:Evaporation_diagramm_field}{{b}{59}{\relax }{figure.caption.69}{}} +\@writefile{lof}{\contentsline {figure}{\numberline {5.4}{\ignorespaces (\subref {fig:penumbra_tilt_sigmas}) AFM image of evaporated \ce {Pb} dot illustrating the penumbral widths used for evaporation analysis $\sigma _s$ and $\sigma _l$, depicted in \textcolor {tab_red}{red}, and the major axis of the tilt \textcolor {tab_green}{(green)}. $\sigma _s$ is drawn larger than actually measured, to aid visibility. The \textcolor {tab_blue}{blue} lines are the major $a$ and minor $b$ axis of the ellipse formed on the evaporated dot. 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This line cut was obtained from \textcolor {tab_green}{(green)} line in (b)}{figure.caption.70}{}} +\newlabel{fig:evaporation_measured_penumbra_sigs}{{5.6a}{62}{\relax }{figure.caption.71}{}} +\newlabel{sub@fig:evaporation_measured_penumbra_sigs}{{a}{62}{\relax }{figure.caption.71}{}} +\newlabel{fig:evaporation_measured_penumbra_sigl}{{5.6b}{62}{\relax }{figure.caption.71}{}} +\newlabel{sub@fig:evaporation_measured_penumbra_sigl}{{b}{62}{\relax }{figure.caption.71}{}} +\newlabel{fig:evaporation_measured_penumbra_height}{{5.6c}{62}{\relax }{figure.caption.71}{}} +\newlabel{sub@fig:evaporation_measured_penumbra_height}{{c}{62}{\relax }{figure.caption.71}{}} +\newlabel{fig:evaporation_measured_penumbra_circle_r}{{5.6d}{62}{\relax }{figure.caption.71}{}} +\newlabel{sub@fig:evaporation_measured_penumbra_circle_r}{{d}{62}{\relax }{figure.caption.71}{}} +\@writefile{lof}{\contentsline {figure}{\numberline {5.6}{\ignorespaces Data obtained from the previously described method for each of the 5 evaporations, one dot each from the center, the left, the right, the bottom and the top. 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The image of the mask was very unstable due to heavy charging effects}{figure.caption.77}{}} -\newlabel{fig:evaporation_SEM_analysis_clog}{{5.9a}{66}{\relax }{figure.caption.78}{}} -\newlabel{sub@fig:evaporation_SEM_analysis_clog}{{a}{66}{\relax }{figure.caption.78}{}} -\newlabel{fig:evaporation_SEM_analysis_clog_overlay}{{5.9b}{66}{\relax }{figure.caption.78}{}} -\newlabel{sub@fig:evaporation_SEM_analysis_clog_overlay}{{b}{66}{\relax }{figure.caption.78}{}} -\@writefile{lof}{\contentsline {figure}{\numberline {5.9}{\ignorespaces (\subref {fig:evaporation_SEM_analysis_clog}) example of the clogging noticed on $4$ of the mask holes. \subref {fig:evaporation_SEM_analysis_clog_overlay} tilt direction from \ref {fig:evaporation_tilts} overlayed over the SEM image of the mask after it was rotated to match the fields.}}{66}{figure.caption.78}\protected@file@percent } -\newlabel{fig:evaporation_SEM_analysis}{{5.9}{66}{(\subref {fig:evaporation_SEM_analysis_clog}) example of the clogging noticed on $4$ of the mask holes. \subref {fig:evaporation_SEM_analysis_clog_overlay} tilt direction from \ref {fig:evaporation_tilts} overlayed over the SEM image of the mask after it was rotated to match the fields}{figure.caption.78}{}} +\newlabel{fig:evaporation_tilts_example}{{5.7a}{64}{\relax }{figure.caption.72}{}} +\newlabel{sub@fig:evaporation_tilts_example}{{a}{64}{\relax }{figure.caption.72}{}} +\newlabel{fig:evaporation_tilts_all}{{5.7b}{64}{\relax }{figure.caption.72}{}} +\newlabel{sub@fig:evaporation_tilts_all}{{b}{64}{\relax }{figure.caption.72}{}} +\@writefile{lof}{\contentsline {figure}{\numberline {5.7}{\ignorespaces (\subref {fig:evaporation_tilts_example}) image of the reconstruction of the tilt angle for Field 3. (\subref {fig:evaporation_tilts_all}) the same for all fields. For fields 1, 4, 5 the full field scans were performed at low resolution and due to this the direction of the tilt could not be determined from the images. The only dots drawn in this case are the high resolution AFM scans of single dots.}}{64}{figure.caption.72}\protected@file@percent } +\newlabel{fig:evaporation_tilts}{{5.7}{64}{(\subref {fig:evaporation_tilts_example}) image of the reconstruction of the tilt angle for Field 3. (\subref {fig:evaporation_tilts_all}) the same for all fields. For fields 1, 4, 5 the full field scans were performed at low resolution and due to this the direction of the tilt could not be determined from the images. The only dots drawn in this case are the high resolution AFM scans of single dots}{figure.caption.72}{}} +\newlabel{fig:evaporation_SEM_sample}{{5.8a}{65}{\relax }{figure.caption.73}{}} +\newlabel{sub@fig:evaporation_SEM_sample}{{a}{65}{\relax }{figure.caption.73}{}} +\newlabel{fig:evaporation_SEM_mask}{{5.8b}{65}{\relax }{figure.caption.73}{}} +\newlabel{sub@fig:evaporation_SEM_mask}{{b}{65}{\relax }{figure.caption.73}{}} +\@writefile{lof}{\contentsline {figure}{\numberline {5.8}{\ignorespaces (\subref {fig:evaporation_SEM_sample}) SEM images of field 2 on the sample. (\subref {fig:evaporation_SEM_mask}) SEM image of the mask. The inset shows another image of the same mask. The image of the mask was very unstable due to heavy charging effects.}}{65}{figure.caption.73}\protected@file@percent } +\newlabel{fig:evaporation_SEM}{{5.8}{65}{(\subref {fig:evaporation_SEM_sample}) SEM images of field 2 on the sample. (\subref {fig:evaporation_SEM_mask}) SEM image of the mask. The inset shows another image of the same mask. The image of the mask was very unstable due to heavy charging effects}{figure.caption.73}{}} +\newlabel{fig:evaporation_SEM_analysis_clog}{{5.9a}{66}{\relax }{figure.caption.74}{}} +\newlabel{sub@fig:evaporation_SEM_analysis_clog}{{a}{66}{\relax }{figure.caption.74}{}} +\newlabel{fig:evaporation_SEM_analysis_clog_overlay}{{5.9b}{66}{\relax }{figure.caption.74}{}} +\newlabel{sub@fig:evaporation_SEM_analysis_clog_overlay}{{b}{66}{\relax }{figure.caption.74}{}} +\@writefile{lof}{\contentsline {figure}{\numberline {5.9}{\ignorespaces (\subref {fig:evaporation_SEM_analysis_clog}) example of the clogging noticed on $4$ of the mask holes. \subref {fig:evaporation_SEM_analysis_clog_overlay} tilt direction from \ref {fig:evaporation_tilts} overlayed over the SEM image of the mask after it was rotated to match the fields.}}{66}{figure.caption.74}\protected@file@percent } +\newlabel{fig:evaporation_SEM_analysis}{{5.9}{66}{(\subref {fig:evaporation_SEM_analysis_clog}) example of the clogging noticed on $4$ of the mask holes. \subref {fig:evaporation_SEM_analysis_clog_overlay} tilt direction from \ref {fig:evaporation_tilts} overlayed over the SEM image of the mask after it was rotated to match the fields}{figure.caption.74}{}} \@writefile{toc}{\contentsline {section}{\numberline {5.5}Simulation}{66}{section.5.5}\protected@file@percent } \newlabel{sec:simulation}{{5.5}{66}{Simulation}{section.5.5}{}} \@writefile{toc}{\contentsline {subsection}{\numberline {5.5.1}Overview and principle}{66}{subsection.5.5.1}\protected@file@percent } \@writefile{toc}{\contentsline {subsection}{\numberline {5.5.2}Results}{68}{subsection.5.5.2}\protected@file@percent } -\newlabel{fig:evaporation_simulation_first_compare_AFM}{{5.10a}{68}{\relax }{figure.caption.79}{}} -\newlabel{sub@fig:evaporation_simulation_first_compare_AFM}{{a}{68}{\relax }{figure.caption.79}{}} -\newlabel{fig:evaporation_simulation_first_compare_SIM}{{5.10b}{68}{\relax }{figure.caption.79}{}} -\newlabel{sub@fig:evaporation_simulation_first_compare_SIM}{{b}{68}{\relax }{figure.caption.79}{}} -\@writefile{lof}{\contentsline {figure}{\numberline {5.10}{\ignorespaces (a) a recorded AFM image, colors are for easier identification. 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(\subref {fig:evaporation_simulation_sharpness_stick_initial}) initial phase with no elliptical oscillation and then drift to the elliptical shape. (\subref {fig:evaporation_simulation_sharpness_stick_power})an anharmonic oscillation with $\sin (\frac {t}{T} + \phi )^{20}$ . The parameters of the ellipse are the same as in Figure \ref {fig:evaporation_simulation_first_compare}.}}{70}{figure.caption.81}\protected@file@percent } -\newlabel{fig:evaporation_simulation_sharpness}{{5.12}{70}{(\subref {fig:evaporation_simulation_sharpness_stick_simple}) Comparison of the evaporation with harmonic oscillation. (\subref {fig:evaporation_simulation_sharpness_stick_initial}) initial phase with no elliptical oscillation and then drift to the elliptical shape. (\subref {fig:evaporation_simulation_sharpness_stick_power})an anharmonic oscillation with $\sin (\frac {t}{T} + \phi )^{20}$ . 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The {A}tmel | {SMART} {SAM3X/A} series datasheet. Online; accessed \bibitem{switch_datasheet} \emph{IC SWITCH SPDTX2 1.8OHM 16TSSOP}, Analog Devices Inc., 2016, rev. B. +\bibitem{torr_seal} +I.~Agilent~Technologies, ``Torr seal data sheet,'' + \url{https://www.agilent.com/cs/library/datasheets/public/data-sheet-torr-seal-products-5994-5102-en-agilent.pdf}, + 2022, [Accessed 02-10-2024]. + \bibitem{grain_growth} \BIBentryALTinterwordspacing E.~BAUER, ``Phänomenologische theorie der kristallabscheidung an oberflächen. diff --git a/thesis.blg b/thesis.blg index 0f779b907c017704f2b7e4870fca8ce0e04ff762..ef33ae9ebe76f218c63eef37a879d92531250adc 100644 --- a/thesis.blg +++ b/thesis.blg @@ -52,45 +52,45 @@ Warning--I'm ignoring grain_growth's extra "title" field Warning--missing publisher in SEM_book Done. -You've used 23 entries, +You've used 24 entries, 4087 wiz_defined-function locations, - 984 strings with 12124 characters, -and the built_in function-call counts, 14942 in all, are: -= -- 1239 -> -- 330 + 989 strings with 12312 characters, +and the built_in function-call counts, 15343 in all, are: += -- 1275 +> -- 334 < -- 104 -+ -- 149 -- -- 60 -* -- 698 -:= -- 2455 -add.period$ -- 48 -call.type$ -- 23 -change.case$ -- 29 ++ -- 151 +- -- 61 +* -- 711 +:= -- 2530 +add.period$ -- 50 +call.type$ -- 24 +change.case$ -- 31 chr.to.int$ -- 237 -cite$ -- 24 -duplicate$ -- 1069 -empty$ -- 1155 -format.name$ -- 70 -if$ -- 3409 +cite$ -- 25 +duplicate$ -- 1103 +empty$ -- 1193 +format.name$ -- 71 +if$ -- 3499 int.to.chr$ -- 0 -int.to.str$ -- 23 -missing$ -- 205 -newline$ -- 118 -num.names$ -- 22 -pop$ -- 509 +int.to.str$ -- 24 +missing$ -- 213 +newline$ -- 121 +num.names$ -- 23 +pop$ -- 529 preamble$ -- 1 purify$ -- 0 quote$ -- 2 -skip$ -- 1119 +skip$ -- 1152 stack$ -- 0 -substring$ -- 583 -swap$ -- 869 +substring$ -- 586 +swap$ -- 889 text.length$ -- 25 text.prefix$ -- 0 top$ -- 5 -type$ -- 23 +type$ -- 24 warning$ -- 1 -while$ -- 43 -width$ -- 25 -write$ -- 270 +while$ -- 44 +width$ -- 26 +write$ -- 279 (There was 1 error message) diff --git a/thesis.log b/thesis.log index 265cccdebd5566cc9e4b1430e6af48f0968ee91d..e0ce0300e2a70e05719fc4416d80614a6dc96781 100644 --- a/thesis.log +++ b/thesis.log @@ -1,4 +1,4 @@ -This is pdfTeX, Version 3.141592653-2.6-1.40.25 (MiKTeX 24.1) (preloaded format=pdflatex 2024.9.29) 1 OCT 2024 21:44 +This is pdfTeX, Version 3.141592653-2.6-1.40.25 (MiKTeX 24.1) (preloaded format=pdflatex 2024.9.29) 2 OCT 2024 19:52 entering extended mode restricted \write18 enabled. %&-line parsing enabled. @@ -2081,8 +2081,6 @@ Underfull \hbox (badness 10000) in paragraph at lines 427--428 (chap03.tex Chapter 3. -Package hyperref Info: bookmark level for unknown todo defaults to 0 on input l -ine 12. <img/Plots/RHK/F0002CH1.CSV.pdf, id=1762, 867.24pt x 650.43pt> File: img/Plots/RHK/F0002CH1.CSV.pdf Graphic file (type pdf) <use img/Plots/RHK/F0002CH1.CSV.pdf> @@ -2101,13 +2099,13 @@ Package pdftex.def Info: img/Plots/RHK/F0003CH1.CSV.pdf used on input line 23. <./img/Plots/RHK/F0002CH1.CSV.pdf> <./img/Plots/RHK/F0003CH1.CSV.pdf>] -<img/Plots/RHK/F0006CH1.CSV.pdf, id=1830, 867.24pt x 650.43pt> +<img/Plots/RHK/F0006CH1.CSV.pdf, id=1829, 867.24pt x 650.43pt> File: img/Plots/RHK/F0006CH1.CSV.pdf Graphic file (type pdf) <use img/Plots/RHK/F0006CH1.CSV.pdf> Package pdftex.def Info: img/Plots/RHK/F0006CH1.CSV.pdf used on input line 37. 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{3.3.4}Amplification}{38}{subsection.3.3.4}% \contentsline {subsection}{\numberline {3.3.5}Programming}{39}{subsection.3.3.5}% -\contentsline {subsubsection}{Parameters}{39}{section*.45}% -\contentsline {paragraph}{Amplitude (amp)}{39}{section*.46}% -\contentsline {paragraph}{Voltage (volt)}{39}{section*.47}% -\contentsline {paragraph}{Channel}{39}{section*.48}% -\contentsline {paragraph}{Max Step}{39}{section*.49}% -\contentsline {paragraph}{Polarity}{39}{section*.50}% +\contentsline {subsubsection}{Parameters}{39}{section*.44}% +\contentsline {paragraph}{Amplitude (amp)}{39}{section*.45}% +\contentsline {paragraph}{Voltage (volt)}{39}{section*.46}% +\contentsline {paragraph}{Channel}{39}{section*.47}% +\contentsline {paragraph}{Max Step}{39}{section*.48}% +\contentsline {paragraph}{Polarity}{39}{section*.49}% \contentsline {subsection}{\numberline {3.3.6}Measured pulse shape}{39}{subsection.3.3.6}% \contentsline {subsection}{\numberline {3.3.7}Operation with the Mask Aligner}{41}{subsection.3.3.7}% \contentsline {chapter}{\numberline {4}Mask Aligner repairs and optimizations}{43}{chapter.4}% @@ -70,44 +70,44 @@ \contentsline {subsection}{\numberline {5.5.2}Results}{68}{subsection.5.5.2}% \contentsline {subsection}{\numberline {5.5.3}Software improvements}{71}{subsection.5.5.3}% \contentsline {subsection}{\numberline {5.5.4}Final Remark}{72}{subsection.5.5.4}% -\contentsline {chapter}{Conclusions and Outlook}{73}{chapter*.83}% -\contentsline {chapter}{Bibliography}{74}{chapter*.84}% -\contentsline {chapter}{List of Abbreviations}{76}{chapter*.85}% -\contentsline {chapter}{Appendix}{i}{chapter*.86}% +\contentsline {chapter}{Conclusions and Outlook}{73}{chapter*.79}% +\contentsline {chapter}{Bibliography}{74}{chapter*.80}% +\contentsline {chapter}{List of Abbreviations}{77}{chapter*.81}% +\contentsline {chapter}{Appendix}{i}{chapter*.82}% \contentsline {section}{\numberline {A}LockIn amplifier settings}{i}{section.5.1}% \contentsline {section}{\numberline {B}Walker principle diagram}{ii}{section.5.2}% \contentsline {section}{\numberline {C}Walker circuit diagrams}{ii}{section.5.3}% \contentsline {section}{\numberline {D}New driver electronics}{vi}{section.5.4}% -\contentsline {paragraph}{pulse?}{vi}{section*.89}% -\contentsline {paragraph}{pol x}{vi}{section*.90}% -\contentsline {paragraph}{amp x}{vi}{section*.91}% -\contentsline {paragraph}{volt x}{vi}{section*.92}% -\contentsline {paragraph}{channel x}{vi}{section*.93}% -\contentsline {paragraph}{maxmstep x}{vi}{section*.94}% -\contentsline {paragraph}{step x}{vi}{section*.95}% -\contentsline {paragraph}{mstep x}{vi}{section*.96}% -\contentsline {paragraph}{cancel}{vii}{section*.97}% -\contentsline {paragraph}{help}{vii}{section*.98}% +\contentsline {paragraph}{pulse?}{vi}{section*.85}% +\contentsline {paragraph}{pol x}{vi}{section*.86}% +\contentsline {paragraph}{amp x}{vi}{section*.87}% +\contentsline {paragraph}{volt x}{vi}{section*.88}% +\contentsline {paragraph}{channel x}{vi}{section*.89}% +\contentsline {paragraph}{maxmstep x}{vi}{section*.90}% +\contentsline {paragraph}{step x}{vi}{section*.91}% +\contentsline {paragraph}{mstep x}{vi}{section*.92}% +\contentsline {paragraph}{cancel}{vii}{section*.93}% +\contentsline {paragraph}{help}{vii}{section*.94}% \contentsline {section}{\numberline {E}Raycast Simulation}{vii}{section.5.5}% -\contentsline {paragraph}{radius\_1}{vii}{section*.99}% -\contentsline {paragraph}{angle}{vii}{section*.100}% -\contentsline {paragraph}{radius\_mask}{vii}{section*.101}% -\contentsline {paragraph}{distance\_circle\_mask}{vii}{section*.102}% -\contentsline {paragraph}{distance\_sample}{vii}{section*.103}% -\contentsline {paragraph}{rays\_per\_frame}{vii}{section*.104}% -\contentsline {paragraph}{running\_time}{vii}{section*.105}% -\contentsline {paragraph}{deposition\_gain}{vii}{section*.106}% -\contentsline {paragraph}{penalize\_deposition}{vii}{section*.107}% -\contentsline 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