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diff --git a/chap03.tex b/chap03.tex
index 116e1d9aa7843f78366ab7eabe6107227ff80ef3..1d45a9bd3064b97f1ba3a06e453081995738e1f5 100644
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@@ -88,7 +88,7 @@ Due to the aforementioned behaviors of the KIM001 device, the device was found t
 
 \section{Mask Aligner controller "Walker"}
 \subsection{Overview}
-In order to find a suitable replacement for the RHK Piezo Motor controller, a new device to drive control pulses to the piezo stacks in the mask aligner was built. The \textbf{P}rinted \textbf{C}ircuit \textbf{B}oard (PCB) is based on the piezo Walker electronics designed to control the piezo Walker used for STM control.\todo{Check if erklärt} Due to this, the device is often referred to as the "Mask Aligner Walker", even though it is not a walker or stepper motor controller. Adaptations were made to adjust it to the desired slip-stick behavior needed for application in the mask aligner. The Controller takes a serial input command and then drives sinusoidal steps with a sharp fast flank at the center of the period. Controllable are the amplitude of the signal and the number of steps. A simplified overview of the entire signal generation process is shown in Appendix \ref{app:walker_diagram}. The following section will look at each part of the process in detail.
+In order to find a suitable replacement for the RHK Piezo Motor controller, a new device to drive control pulses to the piezo stacks in the mask aligner was built. The \textbf{P}rinted \textbf{C}ircuit \textbf{B}oard (PCB) is based on the piezo Walker electronics designed to control the piezo Walker used for STM control. Due to this, the device is often referred to as the "Mask Aligner Walker", even though it is not a walker or stepper motor controller. Adaptations were made to adjust it to the desired slip-stick behavior needed for application in the mask aligner. The Controller takes a serial input command and then drives sinusoidal steps with a sharp fast flank at the center of the period. Controllable are the amplitude of the signal and the number of steps. A simplified overview of the entire signal generation process is shown in Appendix \ref{app:walker_diagram}. The following section will look at each part of the process in detail.
 
 \subsection{Signal generation}
 The core of the Mask aligner controller is an Arduino DUE~\cite{arduino_datasheet}. The  \textbf{C}entral \textbf{P}rocessing \textbf{U}nit (CPU) of the Arduino DUE the "Atmel SAM3X8E ARM Cortex-M3 CPU" is a $32$-Bit ARM-Core microcontroller. Integrated into the CPU is a $12$-Bit \textbf{D}igital to \textbf{A}nalog \textbf{C}onverter (DAC)~\cite{arduino_cpu_datasheet}. The DAC comes with two output channels that can output simultaneously. The signal provided to the DAC is generated via software. The Arduino generates a signal internally with a sampling rate of $404$ kHz with the shape given by:
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+\newlabel{fig:calibration_after_repair}{{4.11}{54}{The final calibration that was performed, after all the optimizations were done. Driving of the motors was done in 2000, 4000, 6000, 8000 and 10000 steps under ambient conditions}{figure.caption.63}{}}
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diff --git a/chap05.aux b/chap05.aux
index 7bf7db44bebf5fbd94e87c3c78b935dd1934e3cc..4117ae739f6cd2646eacf1cf53ee8de597b9ec0e 100644
--- a/chap05.aux
+++ b/chap05.aux
@@ -4,91 +4,91 @@
 \@writefile{lof}{\addvspace {10\p@ }}
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 \@writefile{toc}{\contentsline {section}{\numberline {5.1}Evaporation configuration}{55}{section.5.1}\protected@file@percent }
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+\newlabel{tab:evaporation_settings}{{5.1}{56}{Table with all the evaporation parameters. FIL stands for the current applied to the heating Filament, EMIS stands for the emission current, FLUX is the measured molecular flux. Press is the maximum pressure in the chamber during the evaporation, and T is the maximal temperature the crucible reached during the evaporation. The voltage was changed to ensure FLUX was in the desired range between $450-520$}{table.caption.65}{}}
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+\@writefile{lof}{\contentsline {figure}{\numberline {5.6}{\ignorespaces Data obtained from the previously described method for each of the 5 evaporations, one dot each from the center, the left, the right, the bottom and the top. (\subref  {fig:evaporation_measured_penumbra_sigs})smaller penumbra $\sigma _s$. (\subref  {fig:evaporation_measured_penumbra_sigl}) larger penumbra $\sigma _l$. (\subref  {fig:evaporation_measured_penumbra_height}) height of the dot. (\subref  {fig:evaporation_measured_penumbra_circle_r}) diameter of the circle.}}{62}{figure.caption.70}\protected@file@percent }
+\newlabel{fig:evaporation_measured_penumbra}{{5.6}{62}{Data obtained from the previously described method for each of the 5 evaporations, one dot each from the center, the left, the right, the bottom and the top. (\subref {fig:evaporation_measured_penumbra_sigs})smaller penumbra $\sigma _s$. (\subref {fig:evaporation_measured_penumbra_sigl}) larger penumbra $\sigma _l$. (\subref {fig:evaporation_measured_penumbra_height}) height of the dot. (\subref {fig:evaporation_measured_penumbra_circle_r}) diameter of the circle}{figure.caption.70}{}}
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+\newlabel{fig:evaporation_SEM}{{5.8}{65}{(\subref {fig:evaporation_SEM_sample}) SEM images of field 2 on the sample. (\subref {fig:evaporation_SEM_mask}) SEM image of the mask. The inset shows another image of the same mask. The image of the mask was very unstable due to heavy charging effects}{figure.caption.72}{}}
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     	\caption{}
 		\label{fig:evaporation_SEM_analysis_clog_overlay}
 	\end{subfigure}
-	\caption{(\subref{fig:evaporation_SEM_analysis_clog}) example of the clogging noticed on $4$ of the mask holes. \subref{fig:evaporation_SEM_analysis_clog_overlay} tilt direction from \ref{fig:evaporation_tilts} overlayed over the SEM image of the mask after it was rotated to match the fields.}
+	\caption{(\subref{fig:evaporation_SEM_analysis_clog}) example of the clogging noticed on $4$ of the mask holes. (\subref{fig:evaporation_SEM_analysis_clog_overlay}) tilt direction from \ref{fig:evaporation_tilts} overlayed over the SEM image of the mask after it was rotated to match the fields.}
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