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Images were taken from~\cite {SEM_image_01} and ~\cite {SEM_image_02}}{figure.caption.30}{}} \citation{self_epitaxy} \@setckpt{chap01}{ -\setcounter{page}{33} +\setcounter{page}{31} \setcounter{equation}{3} \setcounter{enumi}{10} \setcounter{enumii}{0} @@ -165,12 +156,12 @@ \setcounter{subsubsection}{0} \setcounter{paragraph}{0} \setcounter{subparagraph}{0} -\setcounter{figure}{22} +\setcounter{figure}{21} \setcounter{table}{0} \setcounter{section@level}{2} \setcounter{Item}{10} \setcounter{Hfootnote}{1} -\setcounter{bookmark@seq@number}{18} +\setcounter{bookmark@seq@number}{17} \setcounter{parentequation}{0} \setcounter{FancyVerbLine}{0} \setcounter{NAT@ctr}{0} diff --git a/chap02.tex b/chap02.tex index b3b4b94da2137be45c3a79736eaf6558d9d76ceb..d55e4080cef6d98a0c29ea28494182d3eb108482 100644 --- a/chap02.tex +++ b/chap02.tex @@ -401,13 +401,13 @@ The difference in capacitance increases monotonically. Upon any contact the step %The values increase monotonically, when however the slope changes, the difference will suddenly drop (Figure \ref{fig:approach_curve_example_cap_diff}). When %the peak value of this graph is known one can predict the contact before it happens and stop the approach before the sample is contacted. This peak value can be used to define a "stop condition". The stop condition has to be determined using a calibration approach. In practice the stop condition has to be chosen a few steps before the peak due to noise. \\ -Absolute distance can still not be measured since upon retraction and subsequent -approach, the capacitance values drop. This is either due to accumulation of -misalignement from tilting and/or -accumulation of particles on the sample/mask surface. -In order to still get replicable alignment, the difference of -capacitance is used. -%The stop condition is used to determine good alignment~\cite{Beeker}. +%Absolute distance can still not be measured since upon retraction and subsequent +%approach, the capacitance values drop. This is either due to accumulation of +%misalignement from tilting and/or +%accumulation of particles on the sample/mask surface. +%In order to still get replicable alignment, the difference of +%capacitance is used. +%%The stop condition is used to determine good alignment~\cite{Beeker}. %\begin{figure}[H] % \centering @@ -419,36 +419,36 @@ capacitance is used. % \label{fig:approach_subsequent} %\end{figure} -\subsection{Reproducibility} -Reproducibility of approach curves with regard to different samples and masks is important for the future use of the Mask Aligner. In the master thesis of Jonas Beeker the -reproducibility of different masks, different locations, different approaches -and a comparison before and after evaporation were discussed~\cite{Beeker}. - -\subsubsection{Reproducibility when removing sample/mask} - -One question concerning reproducibility is whether the approach curve is strongly affected by the exchange of mask or sample, or even just the reinsertion of mask or sample. This can be used to perform a calibration approach curve on one sample and exchange the sample for another. This potentially allows for the evaporation on samples, which were never put into contact with a mask. - -\begin{figure}[H] - \centering - \begin{subfigure}{0.495\textwidth} - \includegraphics[width=\linewidth]{img/MA/InsertionReproducibility.pdf} - \caption{} - \label{fig:approach_replicability_cap} - \end{subfigure} - \begin{subfigure}{0.495\textwidth} - \includegraphics[width=\linewidth]{img/MA/InsertionReproducibility_diff.pdf} - \caption{} - \label{fig:approach_replicability_cap_diff} - \end{subfigure} - \caption{(\subref{fig:approach_replicability_cap}) 3 subsequent approach curves. (\subref{fig:approach_replicability_cap_diff}) corresponding differences in capacitance. \textcolor{tab_green}{Green} is the initial curve. The \textcolor{tab_blue}{blue} curve is after sample has been carefully removed and reinserted. For the \textcolor{tab_red}{red} curve the mask was removed and reinserted. Larger fluctuations in the signal visible on the \textcolor{tab_blue}{Blue} curve are due to an accidental change in time constant of the LockIn Amplifier.} - \label{fig:approach_replicability} -\end{figure} - -Reinserting the mask, the approach curve changed drastically, which can likely be attributed to newly induced tilt on the mask. This can be seen in the shift between the \textcolor{tab_green}{green} and \textcolor{tab_red}{red} curves in Figure \ref{fig:approach_replicability}. - -Another reason might be small movement of the mask frame on the \ce{Nd} magnets tilting the mask. This problem cannot be fixed without a complete redesign of the Mask Aligner. \\ - -Reinserting the sample also induced a difference in approach curves, but this difference is much smaller as can be seen in Figure \ref{fig:approach_replicability} (\textcolor{tab_blue}{blue} and \textcolor{tab_green}{green}). The trend of the curve remains the same, but the absolute value changes slightly. However, the peak in $dC$ changed significantly. A stop condition determined on the \textcolor{tab_green}{green} curve (for example $0.04$ pF) would overshoot the point of first contact on the \textcolor{tab_blue}{blue} curve. This means that after switching a conservative stop condition has to be chosen. \\ +%\subsection{Reproducibility} +%Reproducibility of approach curves with regard to different samples and masks is important for the future use of the Mask Aligner. In the master thesis of Jonas Beeker the +%reproducibility of different masks, different locations, different approaches +%and a comparison before and after evaporation were discussed~\cite{Beeker}. +% +%\subsubsection{Reproducibility when removing sample/mask} +% +%One question concerning reproducibility is whether the approach curve is strongly affected by the exchange of mask or sample, or even just the reinsertion of mask or sample. This can be used to perform a calibration approach curve on one sample and exchange the sample for another. This potentially allows for the evaporation on samples, which were never put into contact with a mask. +% +%\begin{figure}[H] +% \centering +% \begin{subfigure}{0.495\textwidth} +% \includegraphics[width=\linewidth]{img/MA/InsertionReproducibility.pdf} +% \caption{} +% \label{fig:approach_replicability_cap} +% \end{subfigure} +% \begin{subfigure}{0.495\textwidth} +% \includegraphics[width=\linewidth]{img/MA/InsertionReproducibility_diff.pdf} +% \caption{} +% \label{fig:approach_replicability_cap_diff} +% \end{subfigure} +% \caption{(\subref{fig:approach_replicability_cap}) 3 subsequent approach curves. (\subref{fig:approach_replicability_cap_diff}) corresponding differences in capacitance. \textcolor{tab_green}{Green} is the initial curve. The \textcolor{tab_blue}{blue} curve is after sample has been carefully removed and reinserted. For the \textcolor{tab_red}{red} curve the mask was removed and reinserted. Larger fluctuations in the signal visible on the \textcolor{tab_blue}{Blue} curve are due to an accidental change in time constant of the LockIn Amplifier.} +% \label{fig:approach_replicability} +%\end{figure} +% +%Reinserting the mask, the approach curve changed drastically, which can likely be attributed to newly induced tilt on the mask. This can be seen in the shift between the \textcolor{tab_green}{green} and \textcolor{tab_red}{red} curves in Figure \ref{fig:approach_replicability}. +% +%Another reason might be small movement of the mask frame on the \ce{Nd} magnets tilting the mask. This problem cannot be fixed without a complete redesign of the Mask Aligner. \\ +% +%Reinserting the sample also induced a difference in approach curves, but this difference is much smaller as can be seen in Figure \ref{fig:approach_replicability} (\textcolor{tab_blue}{blue} and \textcolor{tab_green}{green}). The trend of the curve remains the same, but the absolute value changes slightly. However, the peak in $dC$ changed significantly. A stop condition determined on the \textcolor{tab_green}{green} curve (for example $0.04$ pF) would overshoot the point of first contact on the \textcolor{tab_blue}{blue} curve. 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This line cut was obtained from \textcolor {tab_green}{(green)} line in (b)}{figure.caption.47}{}} +\newlabel{fig:evaporation_measured_penumbra_sigs}{{3.6a}{49}{\relax }{figure.caption.48}{}} +\newlabel{sub@fig:evaporation_measured_penumbra_sigs}{{a}{49}{\relax }{figure.caption.48}{}} +\newlabel{fig:evaporation_measured_penumbra_sigl}{{3.6b}{49}{\relax }{figure.caption.48}{}} +\newlabel{sub@fig:evaporation_measured_penumbra_sigl}{{b}{49}{\relax }{figure.caption.48}{}} +\newlabel{fig:evaporation_measured_penumbra_height}{{3.6c}{49}{\relax }{figure.caption.48}{}} +\newlabel{sub@fig:evaporation_measured_penumbra_height}{{c}{49}{\relax }{figure.caption.48}{}} +\newlabel{fig:evaporation_measured_penumbra_circle_r}{{3.6d}{49}{\relax }{figure.caption.48}{}} +\newlabel{sub@fig:evaporation_measured_penumbra_circle_r}{{d}{49}{\relax }{figure.caption.48}{}} +\@writefile{lof}{\contentsline {figure}{\numberline {3.6}{\ignorespaces Data obtained from the previously described method for each of the 5 evaporations, one dot each from the center, the left, the right, the bottom and the top. 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The only dots drawn in this case are the high resolution AFM scans of single dots.}}{51}{figure.caption.49}\protected@file@percent } +\newlabel{fig:evaporation_tilts}{{3.7}{51}{(\subref {fig:evaporation_tilts_example}) image of the reconstruction of the tilt angle for Field 3. (\subref {fig:evaporation_tilts_all}) the same for all fields. For fields 1, 4, 5 the full field scans were performed at low resolution and due to this the direction of the tilt could not be determined from the images. The only dots drawn in this case are the high resolution AFM scans of single dots}{figure.caption.49}{}} +\newlabel{fig:evaporation_SEM_mask}{{3.8a}{52}{\relax }{figure.caption.50}{}} +\newlabel{sub@fig:evaporation_SEM_mask}{{a}{52}{\relax }{figure.caption.50}{}} +\newlabel{fig:evaporation_SEM_analysis_clog}{{3.8b}{52}{\relax }{figure.caption.50}{}} +\newlabel{sub@fig:evaporation_SEM_analysis_clog}{{b}{52}{\relax }{figure.caption.50}{}} +\@writefile{lof}{\contentsline {figure}{\numberline {3.8}{\ignorespaces (\subref {fig:evaporation_SEM_mask}) SEM image of the mask. The inset shows another image of the same mask. The image of the mask was very unstable due to heavy charging effects. (\subref {fig:evaporation_SEM_analysis_clog}) example of the clogging noticed on $4$ of the mask holes.}}{52}{figure.caption.50}\protected@file@percent } +\newlabel{fig:evaporation_SEM}{{3.8}{52}{(\subref {fig:evaporation_SEM_mask}) SEM image of the mask. The inset shows another image of the same mask. 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{subsection}{\numberline {1.5.5}Reproducibility}{25}{subsection.1.5.5}% -\contentsline {subsubsection}{Reproducibility when removing sample/mask}{25}{section*.23}% -\contentsline {section}{\numberline {1.6}Mask Aligner operation}{26}{section.1.6}% -\contentsline {subsection}{\numberline {1.6.1}Sample preparation}{26}{subsection.1.6.1}% -\contentsline {section}{\numberline {1.7}Measurement techniques}{27}{section.1.7}% -\contentsline {subsection}{\numberline {1.7.1}Atomic Force Microscopy}{27}{subsection.1.7.1}% -\contentsline {subsubsection}{Modes}{28}{section*.26}% -\contentsline {paragraph}{Contact}{29}{section*.28}% -\contentsline {paragraph}{Non-Contact}{29}{section*.29}% -\contentsline {paragraph}{Tapping}{30}{section*.30}% -\contentsline {subsection}{\numberline {1.7.2}Scanning Electron Microscopy}{30}{subsection.1.7.2}% -\contentsline {chapter}{\numberline {2}Mask Aligner repairs and optimizations}{33}{chapter.2}% -\contentsline {section}{\numberline {2.1}Overview}{33}{section.2.1}% -\contentsline {section}{\numberline {2.2}General UHV device preparation}{34}{section.2.2}% -\contentsline {subsection}{\numberline {2.2.1}UHV compatible Soldering}{34}{subsection.2.2.1}% -\contentsline {section}{\numberline {2.3}Soldering anchors}{34}{section.2.3}% -\contentsline {section}{\numberline {2.4}Piezo regluing}{37}{section.2.4}% -\contentsline {section}{\numberline {2.5}Z3 motor}{38}{section.2.5}% -\contentsline {subsection}{\numberline {2.5.1}Front plate repair}{39}{subsection.2.5.1}% -\contentsline {subsection}{\numberline {2.5.2}Small capacitance stack}{41}{subsection.2.5.2}% -\contentsline {section}{\numberline {2.6}Feed through cabling optimizations}{42}{section.2.6}% -\contentsline {section}{\numberline {2.7}Final test}{43}{section.2.7}% -\contentsline {chapter}{\numberline {3}Evaporations and measurement}{45}{chapter.3}% -\contentsline {section}{\numberline {3.1}Evaporation configuration}{45}{section.3.1}% -\contentsline {section}{\numberline {3.2}Contamination}{47}{section.3.2}% -\contentsline {section}{\numberline {3.3}Penumbra}{48}{section.3.3}% -\contentsline {section}{\numberline {3.4}Tilt and deformation}{52}{section.3.4}% -\contentsline {section}{\numberline {3.5}Simulation}{55}{section.3.5}% -\contentsline {subsection}{\numberline {3.5.1}Overview and principle}{55}{subsection.3.5.1}% -\contentsline {subsection}{\numberline {3.5.2}Results}{57}{subsection.3.5.2}% -\contentsline {subsection}{\numberline {3.5.3}Software improvements}{60}{subsection.3.5.3}% -\contentsline {subsection}{\numberline {3.5.4}Final Remark}{61}{subsection.3.5.4}% -\contentsline {chapter}{\numberline {4}Electronics}{62}{chapter.4}% -\contentsline {section}{\numberline {4.1}RHK piezo motor controller}{62}{section.4.1}% -\contentsline {subsection}{\numberline {4.1.1}Overview}{62}{subsection.4.1.1}% -\contentsline {paragraph}{amplitude}{62}{section*.58}% -\contentsline {paragraph}{sweep period}{62}{section*.59}% -\contentsline {paragraph}{time between sweeps}{62}{section*.60}% -\contentsline {subsection}{\numberline {4.1.2}Pulse shape}{62}{subsection.4.1.2}% -\contentsline {section}{\numberline {4.2}KIM001}{63}{section.4.2}% -\contentsline {subsection}{\numberline {4.2.1}Overview}{63}{subsection.4.2.1}% -\contentsline {subsection}{\numberline {4.2.2}Pulse shape}{63}{subsection.4.2.2}% -\contentsline {subsection}{\numberline {4.2.3}Voltage behavior}{64}{subsection.4.2.3}% -\contentsline {section}{\numberline {4.3}Mask Aligner controller "Walker"}{65}{section.4.3}% -\contentsline {subsection}{\numberline {4.3.1}Overview}{65}{subsection.4.3.1}% -\contentsline {subsection}{\numberline {4.3.2}Signal generation}{65}{subsection.4.3.2}% -\contentsline {subsection}{\numberline {4.3.3}Fast flank}{66}{subsection.4.3.3}% -\contentsline {subsection}{\numberline {4.3.4}Amplification}{67}{subsection.4.3.4}% -\contentsline {subsection}{\numberline {4.3.5}Programming}{68}{subsection.4.3.5}% -\contentsline {subsubsection}{Parameters}{68}{section*.67}% -\contentsline {paragraph}{Amplitude (amp)}{68}{section*.68}% -\contentsline {paragraph}{Voltage (volt)}{68}{section*.69}% -\contentsline {paragraph}{Channel}{68}{section*.70}% -\contentsline {paragraph}{Max Step}{68}{section*.71}% -\contentsline {paragraph}{Polarity}{68}{section*.72}% -\contentsline {subsection}{\numberline {4.3.6}Measured pulse shape}{68}{subsection.4.3.6}% -\contentsline {subsection}{\numberline {4.3.7}Operation with the Mask Aligner}{70}{subsection.4.3.7}% -\contentsline {chapter}{Conclusions and Outlook}{72}{chapter*.76}% -\contentsline {chapter}{Bibliography}{73}{chapter*.77}% -\contentsline {chapter}{List of Abbreviations}{76}{chapter*.78}% -\contentsline {chapter}{Appendix}{77}{chapter*.79}% -\contentsline {section}{\numberline {A}LockIn amplifier settings}{77}{section.4.1}% -\contentsline {section}{\numberline {B}Evaporation parameters}{77}{section.4.2}% -\contentsline {section}{\numberline {C}Walker principle diagram}{78}{section.4.3}% -\contentsline {section}{\numberline {D}Walker circuit diagrams}{78}{section.4.4}% -\contentsline {section}{\numberline {E}Mask Aligner Walker Commands}{82}{section.4.5}% -\contentsline {paragraph}{pulse?}{82}{section*.83}% -\contentsline {paragraph}{pol x}{82}{section*.84}% -\contentsline {paragraph}{amp x}{82}{section*.85}% -\contentsline {paragraph}{volt x}{82}{section*.86}% -\contentsline {paragraph}{channel x}{82}{section*.87}% -\contentsline {paragraph}{maxmstep x}{82}{section*.88}% -\contentsline {paragraph}{step x}{82}{section*.89}% -\contentsline {paragraph}{mstep x}{82}{section*.90}% -\contentsline {paragraph}{cancel}{83}{section*.91}% -\contentsline {paragraph}{help}{83}{section*.92}% -\contentsline {section}{\numberline {F}Mask Aligner Walker Code}{83}{section.4.6}% -\contentsline {section}{\numberline {G}Raycast Simulation}{94}{section.4.7}% -\contentsline {paragraph}{radius\_1}{94}{section*.93}% -\contentsline {paragraph}{angle}{94}{section*.94}% -\contentsline {paragraph}{radius\_mask}{95}{section*.95}% -\contentsline {paragraph}{distance\_circle\_mask}{95}{section*.96}% -\contentsline {paragraph}{distance\_sample}{95}{section*.97}% -\contentsline {paragraph}{rays\_per\_frame}{95}{section*.98}% -\contentsline {paragraph}{running\_time}{95}{section*.99}% -\contentsline {paragraph}{deposition\_gain}{95}{section*.100}% -\contentsline {paragraph}{penalize\_deposition}{95}{section*.101}% -\contentsline {paragraph}{first\_layer\_deposition\_prob}{95}{section*.102}% -\contentsline {paragraph}{oscillation\_period}{95}{section*.103}% -\contentsline {paragraph}{delay\_oscill\_time}{95}{section*.104}% -\contentsline {paragraph}{save\_in\_progress\_images}{95}{section*.105}% -\contentsline {paragraph}{save\_intervall}{95}{section*.106}% -\contentsline {paragraph}{oscillation\_dir}{95}{section*.107}% -\contentsline {paragraph}{oscillation\_rot\_s}{95}{section*.108}% -\contentsline {paragraph}{oscillation\_rot\_e}{96}{section*.109}% -\contentsline {paragraph}{random\_seed}{96}{section*.110}% -\contentsline {paragraph}{x\_min, x\_max, y\_min, y\_max}{96}{section*.111}% -\contentsline {paragraph}{resolution}{96}{section*.112}% -\contentsline {paragraph}{path}{96}{section*.113}% -\contentsline {chapter}{Acknowledgments}{97}{chapter*.114}% +\contentsline {section}{\numberline {1.6}Mask Aligner operation}{25}{section.1.6}% +\contentsline {subsection}{\numberline {1.6.1}Sample preparation}{25}{subsection.1.6.1}% +\contentsline {section}{\numberline {1.7}Measurement techniques}{26}{section.1.7}% +\contentsline {subsection}{\numberline {1.7.1}Atomic Force Microscopy}{26}{subsection.1.7.1}% +\contentsline {subsubsection}{Modes}{27}{section*.24}% +\contentsline {paragraph}{Contact}{27}{section*.26}% +\contentsline {paragraph}{Non-Contact}{27}{section*.27}% +\contentsline {paragraph}{Tapping}{28}{section*.28}% +\contentsline {subsection}{\numberline {1.7.2}Scanning Electron Microscopy}{28}{subsection.1.7.2}% +\contentsline {chapter}{\numberline {2}Mask Aligner repairs and optimizations}{31}{chapter.2}% +\contentsline {section}{\numberline {2.1}Overview}{31}{section.2.1}% +\contentsline {section}{\numberline {2.2}General UHV device preparation}{32}{section.2.2}% +\contentsline {subsection}{\numberline {2.2.1}UHV compatible Soldering}{32}{subsection.2.2.1}% +\contentsline {section}{\numberline {2.3}Soldering anchors}{32}{section.2.3}% +\contentsline {section}{\numberline {2.4}Piezo regluing}{35}{section.2.4}% +\contentsline {section}{\numberline {2.5}Z3 motor}{36}{section.2.5}% +\contentsline {subsection}{\numberline {2.5.1}Front plate repair}{37}{subsection.2.5.1}% +\contentsline {subsection}{\numberline {2.5.2}Small capacitance stack}{39}{subsection.2.5.2}% +\contentsline {section}{\numberline {2.6}Feed through cabling optimizations}{40}{section.2.6}% +\contentsline {section}{\numberline {2.7}Final test}{41}{section.2.7}% +\contentsline {chapter}{\numberline {3}Evaporations and measurement}{43}{chapter.3}% +\contentsline {section}{\numberline {3.1}Evaporation configuration}{43}{section.3.1}% +\contentsline {section}{\numberline {3.2}Contamination}{45}{section.3.2}% +\contentsline {section}{\numberline {3.3}Penumbra}{46}{section.3.3}% +\contentsline {section}{\numberline {3.4}Tilt and deformation}{50}{section.3.4}% +\contentsline {section}{\numberline {3.5}Simulation}{53}{section.3.5}% +\contentsline {subsection}{\numberline {3.5.1}Overview and principle}{53}{subsection.3.5.1}% +\contentsline {subsection}{\numberline {3.5.2}Results}{55}{subsection.3.5.2}% +\contentsline {subsection}{\numberline {3.5.3}Software improvements}{58}{subsection.3.5.3}% +\contentsline {subsection}{\numberline {3.5.4}Final Remark}{59}{subsection.3.5.4}% +\contentsline {chapter}{\numberline {4}Electronics}{60}{chapter.4}% +\contentsline {section}{\numberline {4.1}RHK piezo motor controller}{60}{section.4.1}% +\contentsline {subsection}{\numberline {4.1.1}Overview}{60}{subsection.4.1.1}% +\contentsline {paragraph}{amplitude}{60}{section*.56}% +\contentsline {paragraph}{sweep period}{60}{section*.57}% +\contentsline {paragraph}{time between sweeps}{60}{section*.58}% +\contentsline {subsection}{\numberline {4.1.2}Pulse shape}{60}{subsection.4.1.2}% +\contentsline {section}{\numberline {4.2}KIM001}{61}{section.4.2}% +\contentsline {subsection}{\numberline {4.2.1}Overview}{61}{subsection.4.2.1}% +\contentsline {subsection}{\numberline {4.2.2}Pulse shape}{61}{subsection.4.2.2}% +\contentsline {subsection}{\numberline {4.2.3}Voltage behavior}{62}{subsection.4.2.3}% +\contentsline {section}{\numberline {4.3}Mask Aligner controller "Walker"}{63}{section.4.3}% +\contentsline {subsection}{\numberline {4.3.1}Overview}{63}{subsection.4.3.1}% +\contentsline {subsection}{\numberline {4.3.2}Signal generation}{63}{subsection.4.3.2}% +\contentsline {subsection}{\numberline {4.3.3}Fast flank}{64}{subsection.4.3.3}% +\contentsline {subsection}{\numberline {4.3.4}Amplification}{65}{subsection.4.3.4}% +\contentsline {subsection}{\numberline {4.3.5}Programming}{66}{subsection.4.3.5}% +\contentsline {subsubsection}{Parameters}{66}{section*.65}% +\contentsline {paragraph}{Amplitude (amp)}{66}{section*.66}% +\contentsline {paragraph}{Voltage (volt)}{66}{section*.67}% +\contentsline {paragraph}{Channel}{66}{section*.68}% +\contentsline {paragraph}{Max Step}{66}{section*.69}% +\contentsline {paragraph}{Polarity}{66}{section*.70}% +\contentsline {subsection}{\numberline {4.3.6}Measured pulse shape}{66}{subsection.4.3.6}% +\contentsline {subsection}{\numberline {4.3.7}Operation with the Mask Aligner}{68}{subsection.4.3.7}% +\contentsline {chapter}{Conclusions and Outlook}{70}{chapter*.74}% +\contentsline {chapter}{Bibliography}{71}{chapter*.75}% +\contentsline {chapter}{List of Abbreviations}{74}{chapter*.76}% +\contentsline {chapter}{Appendix}{75}{chapter*.77}% +\contentsline {section}{\numberline {A}LockIn amplifier settings}{75}{section.4.1}% +\contentsline {section}{\numberline {B}Evaporation parameters}{75}{section.4.2}% +\contentsline {section}{\numberline {C}Walker principle diagram}{76}{section.4.3}% +\contentsline {section}{\numberline {D}Walker circuit diagrams}{76}{section.4.4}% +\contentsline {section}{\numberline {E}Mask Aligner Walker Commands}{80}{section.4.5}% +\contentsline {paragraph}{pulse?}{80}{section*.81}% +\contentsline {paragraph}{pol x}{80}{section*.82}% +\contentsline {paragraph}{amp x}{80}{section*.83}% +\contentsline {paragraph}{volt x}{80}{section*.84}% +\contentsline {paragraph}{channel x}{80}{section*.85}% +\contentsline {paragraph}{maxmstep x}{80}{section*.86}% +\contentsline {paragraph}{step x}{80}{section*.87}% +\contentsline {paragraph}{mstep x}{80}{section*.88}% +\contentsline {paragraph}{cancel}{81}{section*.89}% +\contentsline {paragraph}{help}{81}{section*.90}% +\contentsline {section}{\numberline {F}Mask Aligner Walker Code}{81}{section.4.6}% +\contentsline {section}{\numberline {G}Raycast Simulation}{92}{section.4.7}% +\contentsline {paragraph}{radius\_1}{92}{section*.91}% +\contentsline {paragraph}{angle}{92}{section*.92}% +\contentsline {paragraph}{radius\_mask}{93}{section*.93}% +\contentsline {paragraph}{distance\_circle\_mask}{93}{section*.94}% +\contentsline {paragraph}{distance\_sample}{93}{section*.95}% +\contentsline {paragraph}{rays\_per\_frame}{93}{section*.96}% +\contentsline {paragraph}{running\_time}{93}{section*.97}% +\contentsline {paragraph}{deposition\_gain}{93}{section*.98}% +\contentsline {paragraph}{penalize\_deposition}{93}{section*.99}% +\contentsline {paragraph}{first\_layer\_deposition\_prob}{93}{section*.100}% +\contentsline {paragraph}{oscillation\_period}{93}{section*.101}% +\contentsline {paragraph}{delay\_oscill\_time}{93}{section*.102}% +\contentsline {paragraph}{save\_in\_progress\_images}{93}{section*.103}% +\contentsline {paragraph}{save\_intervall}{93}{section*.104}% +\contentsline {paragraph}{oscillation\_dir}{93}{section*.105}% +\contentsline {paragraph}{oscillation\_rot\_s}{93}{section*.106}% +\contentsline {paragraph}{oscillation\_rot\_e}{94}{section*.107}% +\contentsline {paragraph}{random\_seed}{94}{section*.108}% +\contentsline {paragraph}{x\_min, x\_max, y\_min, y\_max}{94}{section*.109}% +\contentsline {paragraph}{resolution}{94}{section*.110}% +\contentsline {paragraph}{path}{94}{section*.111}% +\contentsline {chapter}{Acknowledgments}{95}{chapter*.112}%